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reactive ion etch中文是什么意思

  • 活性離子腐蝕

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  • 例句與用法
  • Narrow gap reactive ion etching system
    狹窄間隙反應(yīng)性離子蝕刻系統(tǒng)
  • Reactive ion etching system rie system
    反應(yīng)性離子蝕刻系統(tǒng)
  • The reactor is capable of working in the rie ( reactive ion etching ) mode and also in the plasma etching mode
    反應(yīng)腔擁有在rie (反應(yīng)離子刻蝕)模式和等離子刻蝕模式下工作的能力。
  • Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave
    摘要采用微波電子回旋共振等離子體反應(yīng)離子刻蝕( ecr - rie )裝置對牦牛毛纖維進行表面改性,從而改善牦牛毛的可紡性。
  • Kionix manufactures inertial sensors using plasma micromachining , a highly - refined , proprietary , deep reactive ion etch drie fabrication technology . the resulting products are ultra - small mechanical elements integrated with electronics to create microelectromechanical systems mems
    Kionix的慣性sensor采用的plasma微機電制程,是一種經(jīng)高度改良且有獨家專利制程,使產(chǎn)品的機械結(jié)構(gòu)部份做到最小并同時與電子電路結(jié)合形成一先進的微機電產(chǎn)品
  • By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
    研究利用常規(guī)的硅集成電路工藝技術(shù)結(jié)合電子束光刻,反應(yīng)離子刻蝕和剝離等技術(shù)制備半導(dǎo)體和金屬納米結(jié)構(gòu),很好地解決了普通光刻與電子束光刻的匹配問題,提高了加工效率,經(jīng)過多次的工藝實驗,摸索出一套制備納米結(jié)構(gòu)的工藝方法,首次用電子束光刻,反應(yīng)離子刻蝕和剝離等技術(shù)制備出了多種納米結(jié)構(gòu)(硅量子線、量子點,雙量子點和三叉指狀的金屬柵結(jié)構(gòu)) 。
  • A large number of attempt and painstaking experiment have been done in this paper according to existing project . we also do lots of chemical and electrochemical etching research in material of lab6 , and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen , wet process etching and electrochemical etching . through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode , molybdenum field emitting cold cathode , tungsten field emitting cold cathode , tungsten rhenium field emitting cold cathode , molybdenum covered with lab6 film field emitting cold cathode
    而且,目前可借鑒的參考文獻較少,圍繞著前人做過的方案,本文做了大量工作,在已有文獻介紹的基礎(chǔ)上,結(jié)合原有的理論和實踐基礎(chǔ),摸索出了包括高溫氧作用反應(yīng)離子( rie )刻蝕法、濕法腐蝕法和電化學(xué)腐蝕法在內(nèi)的三種制備工藝,運用電化學(xué)腐蝕工藝成功制備了單尖的六硼化鑭場發(fā)射冷陰極尖錐、鉬場發(fā)射冷陰極尖錐、鎢場發(fā)射冷陰極尖錐、鎢錸合金場發(fā)射冷陰極尖錐以及有六硼化鑭薄膜覆蓋的鉬場發(fā)射冷陰極尖錐。
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